发明名称 System for attachment of an electrode into a plasma source
摘要 An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
申请公布号 US9053895(B2) 申请公布日期 2015.06.09
申请号 US201113307830 申请日期 2011.11.30
申请人 FEI COMPANY 发明人 Kellogg Sean;Graupera Anthony;Parker N. William;Wells Andrew B.;Utlaut Mark W.;Skoczylas Walter;Schwind Gregory A.;Zhang Shouyin;Smith Noel
分类号 H01J1/02;H01J37/08;H01J37/04;H01J27/16 主分类号 H01J1/02
代理机构 Scheinberg & Associates, PC 代理人 Scheinberg & Associates, PC ;Scheinberg Michael O.
主权项 1. A system for removable attachment of an electrode to a plasma source, comprising: a plasma source having a reaction chamber; an interface layer attached to the reaction chamber; a mounting ring affixed to the interface layer; and a source electrode removably attached to the mounting ring, the combination of the interface layer, mounting ring and source electrode forming a heat conductive seal between the reaction chamber attaching portion and the source electrode.
地址 Hillsboro OR US
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