Microlithographic projection exposure apparatus illumination optics

摘要

Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.

主权项

1. A supplemental optical module configured to be used in an optical system, the optical system being configured so that during use of the optical system when light passes through the optical system along an optical path, the optical system illuminates an illumination field of an object plane of the optical system with the light, the optical system including a first optical module configured so that during use of the optical system the first optical module sets a first illumination setting in a pupil plane of the optical system, the supplemental optical module comprising:
a second optical module configured so that during use of the optical system the second optical module sets a second illumination setting in the pupil plane of the optical system; a decoupling element in the optical path upstream of the first and second optical modules, the at least one decoupling element being configured so that during use of the optical system the decoupling element selectively provides light to at least one of the first and second optical modules; and a coupling element in the optical path downstream from the first and second optical modules, wherein: the coupling element is configured so that, during use of the optical system when the decoupling element provides light to both the first and second optical modules, the coupling element integrates the light which has passed through the first and second optical modules into a common light ray path which is provided to the illumination field; and the optical system is a microlithographic projection exposure apparatus illumination optical system.