METHOD OF FORMING A NANO STRUCTURE AND METHOD OF MANUFACTURING A NANO DEVICE USING THE SAME

摘要

Provided is a method for forming a nanostructure, which comprises: forming a first sacrificial layer pattern extended across a substrate divided into the first and second regions; forming a second sacrificial layer pattern consisting of materials having etching selectivity with respect to the first sacrificial layer pattern in order to cover the second region on the substrate; forming a self-assembled nano thin film on the entire substrate including the first and second sacrificial layer patterns; and forming a nanopattern extended in a direction perpendicular to the side wall of the first sacrificial layer pattern by lifting-off the second sacrificial layer pattern from the substrate.