发明名称 HEMT semiconductor device
摘要 In one embodiment, a semiconductor device includes a first semiconductor layer of a first conductivity type or an intrinsic type. The device further includes a second semiconductor layer of the first conductivity type or the intrinsic type disposed above the first semiconductor layer. The device further includes a third semiconductor layer of a second conductivity type including a first upper portion in contact with the first semiconductor layer, a second upper portion located at a lower position than the first upper portion, a first side portion located between the first upper portion and the second upper portion, and a second side portion located at a lower position than the first side portion.
申请公布号 US9054171(B2) 申请公布日期 2015.06.09
申请号 US201414201641 申请日期 2014.03.07
申请人 Kabushiki Kaisha Toshiba 发明人 Ohno Tetsuya;Saito Yasunobu;Fujimoto Hidetoshi;Yoshioka Akira;Uchihara Takeshi;Naka Toshiyuki;Yasumoto Takaaki;Yanase Naoko;Masuko Shingo;Ono Tasuku
分类号 H01L29/66;H01L29/778;H01L29/20;H01L29/06 主分类号 H01L29/66
代理机构 White & Case LLP 代理人 White & Case LLP
主权项 1. A HEMT semiconductor device comprising: a first semiconductor layer of a first conductivity type or an intrinsic type; a second semiconductor layer of the first conductivity type or the intrinsic type disposed above the first semiconductor layer; a control electrode disposed above the second semiconductor layer; and third semiconductor layers of a second conductivity type, each of which includes a first upper portion in contact with the first semiconductor layer, a second upper portion located at a lower position than the first upper portion, a first side portion located between the first upper portion and the second upper portion, and a second side portion located at a lower position than the first side portion, wherein the control electrode is placed immediately above one of the third semiconductor layers, an area of a region surrounded by the second side portion in a vicinity of the second upper portion is twice or more times as large as an area of a region surrounded by the first side portion in a vicinity of the second upper portion, and a level of the first upper portion of the one of the third semiconductor layers placed immediately below the control electrode is lower than a level of the first upper portion of other third semiconductor layers placed other than immediately below the control electrode.
地址 Tokyo JP