Manufacturing method of substrate for a semiconductor package, manufacturing method of semiconductor package, substrate for a semiconductor package and semiconductor package

摘要

A manufacturing method of a substrate for a semiconductor package includes a resist layer forming step to form a resist layer on a surface of a conductive substrate; an exposure step to expose the resist layer using a glass mask with a mask pattern including a transmission area, a light shielding area, and an intermediate transmission area, wherein transmittance of the intermediate transmission area is lower than that of the transmission area and is higher than that of the light shielding area; a development step to form a resist pattern including a hollow with a side shape including a slope part decreasing in hollow circumference as the hollow circumference approaches the substrate; and a plating step to plate on an exposed area to form a metal layer with a side shape including a slope part decreasing in circumference as the circumference approaches the substrate.

主权项

1. A manufacturing method of a semiconductor package comprising:
a resist layer forming step to form a resist layer on a surface of a conductive substrate; lithographic exposure step to expose the resist layer using a glass mask with a mask pattern including a transmission area where a glass substrate is exposed, a light shielding area where the glass substrate is covered with a light shielding material, and an intermediate transmission area disposed between the transmission area and the light shielding area,
wherein the intermediate transmission area has a mixed pattern of the exposed glass substrate and the light shielding material covering the glass substrate so that transmittance of the intermediate transmission area is lower than that of the transmission area and is higher than that of the light shielding area; a development step to develop the resist layer and to form a resist pattern including a hollow with a side shape including a slope part decreasing in hollow circumference as the hollow circumference approaches the substrate; a plating step to plate on an exposed area of the substrate by using the resist pattern and to form metal layers with a side shape including a slope part decreasing in circumference as the circumference approaches the substrate; a resist removal step to remove the resist pattern; a semiconductor device mounting step to mount a semiconductor device on one of the metal layers of the substrate; a wire bonding step to connect a terminal of the semiconductor device to another metal layer of the metal layers as an electrode; a sealing step to seal the semiconductor device mounted on one of the metal layers of the substrate with resin; and a substrate removal step to remove the substrate from the semiconductor device.