Photolithographically defined contacts to carbon nanostructures

摘要

Methods for the fabrication of nanostructures, including nanostructures comprised of carbon nanotubes, and the nanostructures, devices, and assemblies prepared by these methods, are described.

主权项

1. A method for fabricating a nanostructure comprising:
(a) providing a substrate having at least one nanodimensioned device superposed upon it; (b) overlaying at least a portion of the nanodimensioned device with a layer of a passivating material to form a passivating layer which does not substantially interact with the nanodimensioned device by pi-pi overlap or covalent or ionic bonding; and (c) coating at least a portion of the overlaid passivating layer with at least one photoresist; wherein the nanodimensioned device comprises a conducting nanotube or nanowire, a semiconducting nanotube or nanowire, a metallic nanotube or nanowire, a mat of conducting, semiconducting, or metallic nanotubes or nanowires, or combinations thereof; and wherein the passivating material is a photosensitive aliphatic organic polymer or copolymer or comprises an aliphatic organic polymer or copolymer precursor or a saturated wax or aliphatic surfactant, said passivating material being susceptible to imaging and photoprocessing.