| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning art capable of cleaning a processing region more successfully while inhibiting adhesion of a process liquid to a region on a top face of a substrate other than a peripheral part of the top face. ! SOLUTION: A substrate processing apparatus comprises: a substrate rotation mechanism for holding and rotating a substrate; a discharge part for discharging a process liquid on a processing region on a top face of the substrate rotated by the substrate rotation mechanism, in a predetermined width from a periphery of the substrate; and a cleaning part for cleaning the processing region by being brought into contact with the processing region of the substrate rotated by the substrate rotation mechanism. The discharge part discharge the process liquid toward a main discharge region preliminarily defined in a semi-annular region on a downstream side with respect to the cleaning part in a rotation direction of the substrate in a rotation track in the processing region. ! COP |
