| 摘要 |
Provided is a method for easily forming a high quality copper film which has a low decomposition temperature in supercritical fluid and which incurs less deterioration due to the mixing of C and O. The method for forming a copper-based film on a base of supercritical fluid is as follows: by dissolving copper dimer in a supercritical fluid (N,N′-diisopropylpropionamidinate) and depositing copper on a base. |
