PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX

摘要

The present application relates to a photosensitive resin composition for a black matrix. According to an embodiment of the present application, the composition can have activity even at a wavelength of h-line (405 nm). Accordingly, the composition can form a high-resolution pattern while having high sensitivity even in a maskless exposure device. The photosensitive resin composition includes an alkali soluble binder resin, a multifunctional monomer, a photo-initiator including a compound represented by Chemical formula 1, a coloring agent, and a solvent.