MANUFACTURING METHOD OF INNER MEMBER OF CHAMBER FOR DRY ETCHING

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of an inner member of a chamber for dry etching capable of forming a film having low porosity and high corrosion resistance on an inner member of a chamber for dry etching by easily practiced spray coating.SOLUTION: A yttria film is formed by plasma spray on a member to be used in a chamber for dry etching. Hgas and Ar gas are used as a working gas. The ratio of an Ar gas flow rate to a Hgas flow rate is increased to raise plasma jet velocity and to lower plasma jet temperature. Yttria fine powder of a particle diameter of 10-20 μm is thus formed and used as raw material powder for the plasma jet. The plasma jet containing the fused yttria fine powder is sprayed on the surface of the member.