| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching method in which variations of an etching amount can be minimized. ! SOLUTION: An etching method includes: an object holding step of immersing an object 1 having a flat etching surface 1a into a container 2 holding an etchant 3; a stirring step of stirring the etchant 3 by repeatedly tilting the container 2 to one side and the other side of a fulcrum, with one point of the container 2, when viewed from above, as the fulcrum, within a range where the object 1 is not exposed from the etchant 3; and a rotating step of rotating the object 1 in an outer circumferential direction of an etching surface 1a. ! COPYRIGHT: (C)2015,JPO&INPIT |
