| 摘要 |
PROBLEM TO BE SOLVED: To provide a carrier for polishing treatment and a manufacturing method of a glass substrate for a magnetic disk capable of suppressing the generation of a scratch on an edge surface of the glass substrate and, further, suppressing that a fine particle or the like is attached to a main surface of the glass substrate and a defect is formed.SOLUTION: A retention hole inner circumferential wall surface which demarcates a retention hole for retaining a glass substrate of a carrier for polishing treatment is extended from a connection part of the retention hole inner circumferential wall surface connected with a first carrier main surface of the carrier and is provided with a first inclination surface inclined with respect to the first carrier main surface of the carrier for polishing treatment. On a cross-section of the retention hole cut by a plane which passes through the center axis of the retention hole and is parallel to the plate thickness direction of the carrier for polishing treatment, a cross-section shape of the first inclination surface is a straight line shape extended while making a first inclination angle with respect to the first carrier main surface fixed or a convex curve shape formed by changing the first inclination angle. In a manufacturing method of a glass substrate for a magnetic disk, the glass substrate is polished by using the carrier for polishing treatment. |
