发明名称 PHOTO-SENSITIVE RESIN COMPOSITION
摘要 The present invention relates to a photosensitive resin composition, which has good processes and chemical resistance and is allowed to accurately form hole patterns, comprising 1) an alkali-soluble binder resin, 2) poly functional monomers, 3) photo initiators, 4) coloring agents, 5) solvents, and 6) anti-oxidant agents with compounds represented by chemical formula 1.
申请公布号 KR20150062995(A) 申请公布日期 2015.06.08
申请号 KR20140167979 申请日期 2014.11.28
申请人 LG CHEM. LTD. 发明人 LEE, U RA;KIM, DAE HYUN;PARK, MI HEE;LEE, YOUNG HEE
分类号 G03F7/027;G03F7/004;G03F7/038 主分类号 G03F7/027
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