| 摘要 |
<p>The present invention relates to an apparatus for measuring a horizontal degree of a mounter in a process chamber and a process chamber having the same, capable of measuring a horizontal degree of a mounter wherein a substrate is loaded as being arranged in a vacuum chamber of equipment such as a vacuum deposition apparatus, a vapor deposition device, or a ion injection apparatus which is applied to a manufacturing process of a semiconductor or a display device. An apparatus (10) for measuring a horizontal degree, which is installed in a mounter of a process chamber, comprises: a housing (11); a moving module (12) installed to be vertically moved on an upper portion of the housing (11); a measuring module (14) installed inside the housing (11) to measure a vertically moving level of the moving module (12); and circulation tubes (13a, 13b) connected to a wall surface of the housing (11) and the moving module (12) to enable fluid to be moved. A vertically moving level of the moving module (12) is converted to an electrical signal to be transmitted, and fluid supplied to the circulation tubes (13a, 13b) is formed to be circulated to the outside.</p> |
