| 摘要 |
<p>The present invention has a purpose of providing a substrate processing apparatus which achieves improvement of production speed, reduction of the costs, and certain removal of particles. The substrate processing apparatus according to an embodiment comprises a wipe member (11) relatively moving while contacting with the surface of an antistatic film (Wa) on a substrate (W) to wipe out the surface of the antistatic film (Wa). The wipe member (11) includes an elastomer (11a) being a base body; and a fabric (11b) installed on the surface of the elastomer (11a), and contacting with the surface of the relatively moved antistatic film (Wa).</p> |
