AN IMAGE SENSOR AND METHOD OF FABRICATING THE SAME

摘要

A method of fabricating an image sensor according to an embodiment of the present invention includes preparing a substrate which includes a first to a third pixel region, applying a first color filter layer onto the substrate, forming successively a first sacrificial layer and a first protection layer which cover the entire surface of the first color filter layer, forming a first photoresist pattern on the first protection layer which corresponds to the first pixel region, forming successively a first color filter, a first sacrificial pattern, and a first protection pattern on the first pixel region by etching the first sacrificial layer exposed to the first photoresist pattern and the first protection layer, and separating the first protection pattern by removing selectively the first sacrificial pattern from the first color filter.