OPTIC DEVICE HAVING ANTIREFLECTION NANO PATTERN

摘要

The present invention relates to a method for producing antireflective micro patterns, comprising: a step (a) of injecting a surfactant to a substrate; a step (b) of injecting photoresist to the substrate; and a step (c) of etching the substrate using the surfactant and the photoresist as a mask. Therefore, the present invention provides a method for producing antireflective micro patterns to eliminate a high temperature heat treatment process for the granulation of a metal thin film without restrictions on the selection of substrates and leading processes as the surfactant functions as crosslinking between the hydrophilic substrate and the hydrophobic photoresist and an optical element having antireflective micro patterns produced by the same.