| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device which reduces the size of droplets of a binary fluid and thereby improves substrate cleaning effect. ! SOLUTION: A substrate cleaning device includes: a binary fluid nozzle 42 which supplies binary fluid jet-flow to a surface of a substrate; a gas supply line 55 which supplies a gas to a mixing chamber 61 in the binary fluid nozzle 42; a liquid supply line 57 which supplies a liquid to the binary fluid nozzle 42; and a droplet formation device 90 which forms droplets from the liquid supplied to the binary fluid nozzle 42 and supplies the droplets to the mixing chamber 61. ! COPYRIGHT: (C)2015,JPO&INPIT |
