发明名称 Gated Bipolar Junction Transistors, Memory Arrays, and Methods of Forming Gated Bipolar Junction Transistors
摘要 Some embodiments include gated bipolar junction transistors. The transistors may include a base region between a collector region and an emitter region; with a B-C junction being at an interface of the base region and the collector region, and with a B-E junction being at an interface of the base region and the emitter region. The transistors may include material having a bandgap of at least 1.2 eV within one or more of the base, emitter and collector regions. The gated transistors may include a gate along the base region and spaced from the base region by dielectric material, with the gate not overlapping either the B-C junction or the B-E junction. Some embodiments include memory arrays containing gated bipolar junction transistors. Some embodiments include methods of forming gated bipolar junction transistors.
申请公布号 US2015155283(A1) 申请公布日期 2015.06.04
申请号 US201514613876 申请日期 2015.02.04
申请人 Micron Technology, Inc. 发明人 Gupta Rajesh N.;Nemati Farid;Robins Scott T.
分类号 H01L27/102;H01L21/8229;H01L21/02;H01L29/732;H01L29/739;H01L29/16 主分类号 H01L27/102
代理机构 代理人
主权项 1. A memory array, comprising: a series of access lines; a series of bitlines; and a plurality of gated bipolar junction transistors, individual of the gated bipolar junction transistors being uniquely addressed through combinations containing one of the bitlines and one of the access lines; the individual gated bipolar junction transistors comprising: a vertical transistor pillar having a base region between a pair of emitter/collector regions; one of the emitter/collector regions being a first emitter/collector region and the other being a second emitter/collector region; a first junction being at an interface of the base region and the first emitter/collector region, and a second junction being at an interface of the base region and the second emitter/collector region; at least a portion of the vertical transistor pillar comprising a material having a bandgap greater than or equal to 1.2 eV; the first emitter/collector region being directly electrically coupled with a bitline; anda gate along the base region of the vertical transistor pillar and spaced from the base region by dielectric material; the gate not vertically overlapping either of the first and second junctions; the gate being a region of an access line.
地址 Boise ID US