发明名称 |
METHOD AND APPARATUS FOR COATING NANOPARTICULATE FILMS ON COMPLEX SUBSTRATES |
摘要 |
Active films and processes for depositing the same onto a complex 3D shape substrates and implants are provided. The process comprises the following steps: inserting into a process chamber a sputtering target, including at least two chemical elements and a complex shape 3D substrate on a substrate holder, providing a gas to be ionized into the process chamber with a controlled pressure; applying a voltage in pulse between the sputtering target and the complex shape 3D substrate; and generating a magnetic field at the surface of the sputtering target inside the process chamber as required for HIPIMS. |
申请公布号 |
WO2015079286(A1) |
申请公布日期 |
2015.06.04 |
申请号 |
WO2013IB60439 |
申请日期 |
2013.11.27 |
申请人 |
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) |
发明人 |
KIWI, JUAN;RTIMI, SAMI;PULGARIN, CÉSAR |
分类号 |
C23C14/35;C23C14/00;C23C14/08;C23C14/20;C23C14/34 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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