发明名称 ALKALINE SOLUBLE RESIN, PROCESS FOR PREPARING SAME, AND PHOTORESIST COMPOSITION CONTAINING SAME
摘要 An alkaline soluble resin, a process for preparing the same, and a photoresist composition containing the same. The alkaline soluble resin is a polyether chain-containing acrylate alkaline soluble resin. A photoresist composition comprising said alkaline soluble resin can reduce the slope angle of the film layer and prevent gaps which cause light leakage from forming in the junction between the colored film layer and the black matrix. Moreover, the coating and the rubbing effect of the orientation layer can be improved.
申请公布号 US2015152210(A1) 申请公布日期 2015.06.04
申请号 US201314239552 申请日期 2013.07.26
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 Wang Xuelan;Tang Chen;Chang Shan
分类号 C08F261/00;G03F7/033 主分类号 C08F261/00
代理机构 代理人
主权项 1. An alkaline soluble resin, wherein the alkaline soluble resin is a polyether chain-containing acrylate alkaline soluble resin obtained from grafting an acrylate alkaline soluble resin with a polyether chain-containing monoacid.
地址 Beijing CN