POLARITY CONTROL FOR REMOTE PLASMA

摘要

Methods of controlling the polarity of capacitive plasma power applied to a remote plasma are described. Rather than applying a plasma power which involves both a positive and negative voltage swings equally, a capacitive plasma power is applied which favors either positive or negative voltage swings in order to select desirable process attributes. For example, the plasma power may be formed by applying a unipolar oscillating voltage between an electrode and a perforated plate. The unipolar oscillating voltage may have only positive or only negative voltages between the electrode and the perforated plate. The unipolar oscillating voltage may cross electrical ground in some portion of its oscillating voltage.

主权项

1. A method of processing a substrate, the method comprising:
transferring the substrate into a substrate processing region of a substrate processing chamber; applying a unipolar oscillating voltage between an electrode and a perforated plate, wherein the unipolar oscillating voltage, on average, biases the perforated plate at a positive voltage relative to the electrode; forming a remote plasma between the electrode and the perforated plate to form plasma effluents; flowing the plasma effluents into the substrate processing region housing the substrate, wherein the plasma effluents flow into the substrate processing region through perforations in the perforated plate; and reacting the plasma effluents with the substrate.