| 发明名称 |
CLOSED LOOP CONTROL |
| 摘要 |
A method of controlling a reactive deposition process and a corresponding assembly and/or apparatus are described. The method includes providing power to a cathode with a power supply, providing a voltage set point to the power supply, receiving a power value correlating the power provided to the cathode, and controlling a flow of a process gas in dependence of the power value to provide a closed loop control for the power value. |
| 申请公布号 |
US2015152542(A1) |
申请公布日期 |
2015.06.04 |
| 申请号 |
US201114357168 |
申请日期 |
2011.11.30 |
| 申请人 |
Deppisch Thomas;Helle Franz-Josef;Englert Manfred;Hermanns Uwe |
发明人 |
Deppisch Thomas;Helle Franz-Josef;Englert Manfred;Hermanns Uwe |
| 分类号 |
C23C14/00;C23C14/56;H01J37/34 |
主分类号 |
C23C14/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of controlling a reactive deposition process, comprising:
providing power to a cathode with a power supply; providing a voltage set point to the power supply; receiving a power value correlating the power provided to the cathode; and controlling a flow of a process gas in dependence of the power value to provide a closed loop control. |
| 地址 |
Aschaffenburg DE |
