| 摘要 |
<p>An inner circle double-wheel polishing machine, comprising a first polishing wheel (1) and a second polishing wheel (2) respectively having an outer circumferential surface (13, 14), circle centers (15, 16) and a plurality of mounting grooves (17, 18); the polishing machine further comprises a plurality of fixing bases (3) fixed in the mounting grooves (17, 18), a plurality of polishing units (4) connected to the fixing base (3) and used to polish the inner circle of a workpiece, a transmission unit for driving the first polishing wheel (1) and the second polishing wheel (2) to rotate, and a support for bearing the first polishing wheel (1) and the second polishing wheel (2). During polishing, the resistance on both the first polishing wheel and the second polishing wheel mutually counteract, thus enabling smoother operation and improving polishing efficiency.</p> |
