| 摘要 |
The invention relates to a method for embossing at least one microstructure or nanostructure using a mold (1) that has at least one embossing structure (2), said method involving the following steps, in particular the following sequence: orienting the embossing structure (2) of the mold (1) in relation to a dosing device (4), dosing an imprint material (6) into the embossing structure (2) by means of the dosing device (4), at least partially curing the imprint material (6), and embossing the imprint material (6). The method is characterized in that the embossing structures (2) point in a direction of gravity (G) at least during the dosing step. The invention further relates to a corresponding device. |
