Reduction of Charging Induced Damage in Photolithography Wet Process

摘要

An approach is developed to use an acidic rinse to reduce charge during the lithographic process, and thereby eliminate the crystalline damage and associated yield loss associated with the accumulated charge. The crystalline damage has been found to occur for certain thicknesses of dielectric layers, and such damage is irreparable. A sparge can be used to dissolve carbon dioxide in water to provide a weak acidic rinse.

主权项

1. A method comprising:
forming a dielectric layer over a substrate, the dielectric layer having a thickness; patterning the dielectric layer, the patterning including using a developer having a pH greater than 7; and applying a weak acidic rinse to the patterned dielectric layer.