发明名称 |
SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME |
摘要 |
A semiconductor manufacturing apparatus may include a chamber accommodating a substrate to be processed, a first electrode providing electric field in the chamber and a second electrode opposing to the first electrode, and a first power transmitting rod connected to one of the first electrode and the second electrode. A conductive stress attenuating unit may be formed in the first power transmitting rod. Methods of manufacturing semiconductor devices using the semiconductor manufacturing apparatus are also disclosed. |
申请公布号 |
US2015155140(A1) |
申请公布日期 |
2015.06.04 |
申请号 |
US201414543897 |
申请日期 |
2014.11.18 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Lee Ju-hee;Lee Su-ho;Jang Won-hyuk;Park Jae-beom;Kim Ik-soo;Kim Myoung-woon |
分类号 |
H01J37/32;H01J37/20;H01L21/67 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor manufacturing apparatus comprising:
a chamber; a first electrode formed in the chamber; a second electrode opposite the first electrode; and a first power transmitting rod connected to one of the first electrode and the second electrode, the first power transmitting rod having one end portion and another end portion, wherein, a first conductive stress attenuating unit is formed between the one end portion and the other end portion of the first power transmitting rod. |
地址 |
Suwon-si KR |