发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
摘要 A semiconductor manufacturing apparatus may include a chamber accommodating a substrate to be processed, a first electrode providing electric field in the chamber and a second electrode opposing to the first electrode, and a first power transmitting rod connected to one of the first electrode and the second electrode. A conductive stress attenuating unit may be formed in the first power transmitting rod. Methods of manufacturing semiconductor devices using the semiconductor manufacturing apparatus are also disclosed.
申请公布号 US2015155140(A1) 申请公布日期 2015.06.04
申请号 US201414543897 申请日期 2014.11.18
申请人 Samsung Electronics Co., Ltd. 发明人 Lee Ju-hee;Lee Su-ho;Jang Won-hyuk;Park Jae-beom;Kim Ik-soo;Kim Myoung-woon
分类号 H01J37/32;H01J37/20;H01L21/67 主分类号 H01J37/32
代理机构 代理人
主权项 1. A semiconductor manufacturing apparatus comprising: a chamber; a first electrode formed in the chamber; a second electrode opposite the first electrode; and a first power transmitting rod connected to one of the first electrode and the second electrode, the first power transmitting rod having one end portion and another end portion, wherein, a first conductive stress attenuating unit is formed between the one end portion and the other end portion of the first power transmitting rod.
地址 Suwon-si KR