| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad and a method of manufacturing the same which can achieve improvement of flatness and planarization efficiency of a polished surface, can reduce generation of scratches, and can be used for a long period of time.SOLUTION: A polishing pad includes a sheet, as a polishing layer, which has unwoven fiber base material in which a plurality of wet-heat adhesive fibers containing wet-heat adhesive resin are adhered, and has apparent density of 0.3-0.9 g/cm, D hardness of 25-65, and a wear reduction amount of 10-600 mg. |
