| 发明名称 |
METHOD FOR MANUFACTURING PATTERN USING CHEMICALLY AMPLIFIED RESIST |
| 摘要 |
A method of manufacturing a pattern includes forming a pattern material layer on a substrate, forming a protective layer on the pattern material layer, forming a resist layer on the protective layer, selectively exposing the resist layer to light, and developing the selectively exposed resist layer. |
| 申请公布号 |
US2015155161(A1) |
申请公布日期 |
2015.06.04 |
| 申请号 |
US201414295463 |
申请日期 |
2014.06.04 |
| 申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
CHUN Jun;KIM Ji-Hyun;PARK Sung-Kyun;PARK Jeong-Min;LEE Jung-Soo;JU Jin-Ho |
| 分类号 |
H01L21/027;G03F7/039 |
主分类号 |
H01L21/027 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of manufacturing a pattern, the method comprising:
forming a pattern material layer on a substrate; forming a protective layer on the pattern material layer; forming a resist layer on the protective layer; selectively exposing the resist layer to light; and developing the selectively exposed resist layer. |
| 地址 |
Yongin-si KR |
