发明名称 |
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS |
摘要 |
The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%. |
申请公布号 |
US2015153654(A1) |
申请公布日期 |
2015.06.04 |
申请号 |
US201414563087 |
申请日期 |
2014.12.08 |
申请人 |
Carl Zeiss SMT GmbH |
发明人 |
Fiolka Damian;Maul Manfred;Schwab Markus;Seitz Wolfgang;Dittmann Olaf |
分类号 |
G03F7/20;G02B27/28 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Oberkochen DE |