发明名称 SILICON SUBSTRATE HAVING TEXTURED SURFACE, AND METHOD FOR MANUFACTURING SAME
摘要 Provided are a silicon substrate having a textured surface formed using a dry-etching method, and a solar cell including the substrate. In the present invention, a textured surface having a plurality of projections having three projections with a height of more than 1.5 µm to 10 µm is formed on the surface of a silicon substrate having the substrate plane orientation (111). The silicon substrate is manufactured by a step for preparing the silicon substrate having the substrate plane orientation (111), and a step for exposing the surface of the silicon substrate to etching gas.
申请公布号 EP2793253(A4) 申请公布日期 2015.06.03
申请号 EP20120857614 申请日期 2012.12.04
申请人 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. 发明人 YAMAGUCHI, NAOSHI;TANABE, HIROSHI;TANIGUCHI, YASUSHI;NAKAYAMA, ICHIRO
分类号 H01L31/0236 主分类号 H01L31/0236
代理机构 代理人
主权项
地址