发明名称 Method of filling through-holes
摘要 The methods inhibit or reduce dimpling and voids during copper electroplating of through-holes with flash copper layers in substrates such as printed circuit boards. An acid solution containing reaction products of aromatic heterocyclic nitrogen compounds and epoxy-containing compounds is applied to the through-holes of the substrate followed by filling the through-holes with copper using a copper electroplating bath which includes additives such as brighteners and levelers.
申请公布号 EP2778260(A3) 申请公布日期 2015.06.03
申请号 EP20140159759 申请日期 2014.03.14
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC 发明人 JAYARAJU, NAGARAJAN;NAJJAR, ELIE H.;BARSTAD, LEON R.
分类号 C25D3/38;C25D5/02;C25D5/10;C25D5/34;H05K3/00 主分类号 C25D3/38
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