发明名称 |
Hydroxyl-containing monomer, polymer, resist composition, and patterning process |
摘要 |
<p>A hydroxyl-containing monomer of formula (1) is provided wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are monovalent C 1 -C 15 hydrocarbon groups, or R 2 and R 3 may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up to 500 nm and the effect of controlling acid diffusion so that the polymers may be used as a base resin to formulate radiation-sensitive resist compositions having a high resolution.</p> |
申请公布号 |
EP2103592(B1) |
申请公布日期 |
2015.06.03 |
申请号 |
EP20090003777 |
申请日期 |
2009.03.16 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KINSHO, TAKESHI;OHASHI, MASAKI;HASEGAWA, KOJI;WATANABE, TAKERU |
分类号 |
C07C69/54;C08F220/18;G03F7/039 |
主分类号 |
C07C69/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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