| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid processing method which optimize the state of air flow above a substrate according to a process of the liquid processing.SOLUTION: A liquid processing apparatus 1 performing liquid processing to a substrate W comprises: a support member 10 horizontally supporting the substrate W and rotating with the substrate W; a cover 20 forming a processing chamber S for performing the liquid processing to the substrate W with the support member 10 and including an opening 24 from which a gas flows into the processing chamber S; a liquid supply member 30 supplying a process liquid to the substrate W from above in the process chamber S; a cap 40 enclosing an annular gap GP formed between an outer peripheral part 13 of the support member 10 and an outer peripheral part 23 of the cover 20 and receiving the process liquid shaken off from the rotating substrate W through the annular gap GP; an adjustment mechanism 122 adjusting the annular gap GP; and a moving mechanism 132 moving the liquid supply member 30 close to/away from the opening 24 of the processing chamber S. |
