发明名称 COMPOSITION THAT FORMS N-TYPE DIFFUSION LAYER, N-TYPE DIFFUSION LAYER MANUFACTURING METHOD AND SOLAR CELL ELEMENT MANUFACTURING METHOD
摘要 A composition for forming an n-type diffusion layer includes a glass powder containing P 2 O 5 , SiO 2 and CaO and a dispersion medium. An n-type diffusion layer and a photovoltaic cell element having an n-type diffusion layer are produced by applying the composition for forming an n-type diffusion layer on a semiconductor substrate and by subjecting the substrate to a thermal diffusion treatment.
申请公布号 EP2743967(A4) 申请公布日期 2015.06.03
申请号 EP20120814632 申请日期 2012.07.17
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 MACHII, YOICHI;YOSHIDA, MASATO;NOJIRI, TAKESHI;IWAMURO, MITSUNORI;ORITA, AKIHIRO;ADACHI, SHUICHIRO;SATO, TETSUYA
分类号 H01L21/225;H01L31/18 主分类号 H01L21/225
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