METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,申请号KR20080095936-传众专利搜索

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发明名称	METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要	<p>반도체 소자의 제조방법이 개시된다. 상기 방법은 개구부를 갖는 절연층의 상부면 및 상기 개구부 내에 상변화 물질 패턴을 형성하는 단계와 상기 상변화 물질 패턴 상에 상기 상변화 물질 패턴을 압축하는 압축막을 형성하는 단계를 포함한다.</p>
申请公布号	KR101525588(B1)	申请公布日期	2015.06.03
申请号	KR20080095936	申请日期	2008.09.30
申请人		发明人
分类号	H01L21/8247;H01L27/115	主分类号	H01L21/8247
代理机构		代理人
主权项
地址

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