发明名称 SIMULTANEOUS MEASUREMENT METHOD AND SYSTEM OF PLASMA ION DISTRIBUTION USING MULTI-ENERGY FILTER ARRAY
摘要 The present invention relates to a plasma ion distribution measurement method and system using an X-ray multi-energy filter array capable of accurately measuring an ion spatial distribution which is a source of X-ray generation in a plasma by acquiring analysis images of an X-ray of various wavelengths generated in the plasma by energy (wavelength range) simultaneously using a multi-energy filter array integrated on a plurality of pin holes, and monitoring the ion spatial distribution in real time. According to an embodiment of the present invention, the analysis images of the X-ray of various wavelengths emitted from the plasma generated in different ions in the plasma are effectively acquired simultaneously in a single measurement using the pin hole array on which the multi-energy filter is integrated, and thus the X-ray at each energy (wavelength range) can be simultaneously analyzed to accurately measure the ion spatial distribution in the plasma. Additionally, the analysis images of the X-ray of various wavelengths by energy (wavelength range) can be acquired in real time using the pin holes on which the multi-energy filter is integrated to conveniently monitor a change in spatial distribution of the ions present in the plasma.
申请公布号 KR20150060383(A) 申请公布日期 2015.06.03
申请号 KR20130144744 申请日期 2013.11.26
申请人 KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE 发明人 HEO, DU CHANG;KIM, JAE HOON;YANG, KEE DONG
分类号 G01T1/36 主分类号 G01T1/36
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