发明名称 |
SIMULTANEOUS MEASUREMENT METHOD AND SYSTEM OF PLASMA ION DISTRIBUTION USING MULTI-ENERGY FILTER ARRAY |
摘要 |
The present invention relates to a plasma ion distribution measurement method and system using an X-ray multi-energy filter array capable of accurately measuring an ion spatial distribution which is a source of X-ray generation in a plasma by acquiring analysis images of an X-ray of various wavelengths generated in the plasma by energy (wavelength range) simultaneously using a multi-energy filter array integrated on a plurality of pin holes, and monitoring the ion spatial distribution in real time. According to an embodiment of the present invention, the analysis images of the X-ray of various wavelengths emitted from the plasma generated in different ions in the plasma are effectively acquired simultaneously in a single measurement using the pin hole array on which the multi-energy filter is integrated, and thus the X-ray at each energy (wavelength range) can be simultaneously analyzed to accurately measure the ion spatial distribution in the plasma. Additionally, the analysis images of the X-ray of various wavelengths by energy (wavelength range) can be acquired in real time using the pin holes on which the multi-energy filter is integrated to conveniently monitor a change in spatial distribution of the ions present in the plasma. |
申请公布号 |
KR20150060383(A) |
申请公布日期 |
2015.06.03 |
申请号 |
KR20130144744 |
申请日期 |
2013.11.26 |
申请人 |
KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE |
发明人 |
HEO, DU CHANG;KIM, JAE HOON;YANG, KEE DONG |
分类号 |
G01T1/36 |
主分类号 |
G01T1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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