| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device analysis system, a device analysis method and a device analysis program for efficiently evaluating respective element shapes in a device comprising a plurality of element shapes. <P>SOLUTION: A control section 21 of a device analyzer 20 registers a measured value of an output characteristic and executes a generation process of model parameters of element shapes for implementing the measured value. Then, the control section 21 executes a statistical process of the model parameters and specifies a model parameter with a large variation. Then, the control section 21 specifies the factor of the model parameter with a large variation. Herein, the shape element corresponding to the model parameter is specified. The control section 21 executes an evaluation output process. Further, when acquiring new structure information, the control section 21 calculates a model parameter corresponding to the structure and executes a design process using the statistical value. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
