发明名称 ELECTROPLATING SOLUTION CONTROL SYSTEM
摘要 <p>According to the present invention, disclosed is a control system to make an electroplating solution which comprises: a circulation tank circulating and supplying plating solution to electroplate to a plating cell; a reaction tank reacting the plating solution supplied from the circulation tank with a metal piece, and re-inputting the plating solution to the circulation tank; a solution analyzer installed in a supply line to the reaction tank measuring sulfate ion concentration of the plating solution; a plating solution flow rate adjusting unit adjusting a flow rate of the plating solution supplied to the reaction tank; and a control unit applying a control signal to the plating solution flow rate adjusting unit based on an information related to a metal consumption received from a main controller of an electroplating line, and other information about the sulfate ion concentration received from the solution analyzer.</p>
申请公布号 KR20150060179(A) 申请公布日期 2015.06.03
申请号 KR20130144308 申请日期 2013.11.26
申请人 POSCO 发明人 PARK, SANG GYU
分类号 C25D21/12;C25D21/14 主分类号 C25D21/12
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