发明名称 |
LASER-PRODUCED PLASMA EUV SOURCE WITH REDUCED DEBRIS GENERATION |
摘要 |
A method and apparatus for generating extreme ultraviolet (EUV) light is disclosed. The method may comprise non-thermally ablating a target material utilizing a first laser beam. The first laser beam may be configured for ejecting a portion of the target material in a non-thermal manner to create a plume. The method may further comprise irradiating the plume utilizing a second laser beam to produce a high-temperature plasma for EUV radiation. |
申请公布号 |
EP2754213(A4) |
申请公布日期 |
2015.06.03 |
申请号 |
EP20120830191 |
申请日期 |
2012.09.06 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
DELGADO, GILDARDO;WACK, DANIEL |
分类号 |
H05G2/00;G03F7/20 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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