Method for producing EUV masks minimising the impact of substrate defects

摘要

The method involves generating blank masks having defects (D), and performing mapping of individual positions of defects of each mask by using an inspection machine. A set of concatenated mapping defects is established, and a set of mask positions is identified by mapping different mask blank defects. An electronic version of drawings of the masks is produced by taking all drawing rules into account locally so as to prohibit placing of critical components in defect zones (ZD). An unspecified white mask is produced along with a respective product design.