Projection exposure tool for microlithography and method for microlithographic imaging

摘要

A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine a relative position of measurement structures disposed on a surface of one of the substrates in relation to one another in at least one lateral direction with respect to the substrate surface and to thereby simultaneously measure a number of measurement structures disposed laterally offset in relation to one another.

主权项

1. A tool, comprising:
a measuring apparatus configured to determine a relative position of measurement structures relative to each other in a lateral direction, wherein:
the tool is a microlithography projection exposure tool configured to image mask structures of a first substrate onto a second substrate which is different from the first substrate;the measurement structures are disposed on a surface of the first substrate, or the measurement structures are disposed on a surface of the second substrate; andthe measuring apparatus is configured so that, during use of the measuring apparatus:
the measuring apparatus sends measuring light to a diffractive optical element which splits the measuring light into at least two measuring beams with different propagation directions;the at least two measuring beams run back to the diffractive optical element which combines the at least two measuring beams into a combined beam; andthe measuring apparatus simultaneously measures the measurement structures which are laterally offset relative to each other based on the combined beam.