Optical element and exposure apparatus

摘要

An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and the projection optical system. The optical element includes a first anti-dissolution member provided on a surface of a transmissive optical element on the substrate's side of the projection optical system.

主权项

1. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate using a projection system and having a liquid supply system configured to at least partly fill a space between the projection system and a local area of a surface of the substrate with a liquid, wherein an element of the projection system through which the pattern is projected has, on a first surface configured to be in contact with the liquid, a protective coating which is substantially insoluble in the liquid, wherein the element of the projection system is transmissive such that the pattern passes through the element from one side of the element and through the protective coating thereon to the substrate disposed on another side of the element, and wherein the element of the projection system has, on a second surface inclined with respect to the first surface, a light shielding coating provided such that the exposure light is substantially prevented from transmitting through the second surface.