发明名称 |
Resist composition for negative tone development and pattern forming method using the same |
摘要 |
For stably forming a high-precision fine pattern and thereby producing a highly integrated electronic device with high precision, a resist composition for negative tone development, which can reduce the line edge roughness and enhance the in-plane uniformity of the pattern dimension and furthermore, can ensure excellent bridge margin, and a pattern forming method using the same are provided.;A resist composition for negative tone development, comprising (A) a resin capable of increasing the polarity by the action of an acid to increase the solubility in a positive tone developer and decrease the solubility in a negative tone developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, wherein the log P value of the acid generated from the (B) compound capable of generating an acid upon irradiation with an actinic ray or radiation is from 1.5 to 12.0; and a pattern forming method using the same. |
申请公布号 |
US9046782(B2) |
申请公布日期 |
2015.06.02 |
申请号 |
US200812664155 |
申请日期 |
2008.06.12 |
申请人 |
FUJIFILM Corporation |
发明人 |
Tsubaki Hideaki |
分类号 |
G03F7/32;G03F7/30;G03F7/20;G03F7/039;G03F7/004 |
主分类号 |
G03F7/32 |
代理机构 |
Sughrue Mion, PLLC |
代理人 |
Sughrue Mion, PLLC |
主权项 |
1. A pattern forming method, comprising:
(i) a step of applying a resist composition for negative tone development, comprising (A) a resin capable of increasing a polarity of the resin (A) by an action of an acid to increase a solubility of the resin (A) in a positive tone developer and decrease a solubility of the resin (A) in a negative tone developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, in which a logP value of the acid generated from (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is from 1.5 to 12.0; (ii) an exposure step; and (iv) a step of performing development by using a negative tone developer, wherein the negative tone developer contains an organic solvent and the organic solvent contained in the negative tone developer is ester-based solvent, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is a compound containing in an anion structure thereof a group having a non-fluorine-substituted hydrocarbon skeleton having a carbon number of 2 or more. |
地址 |
Tokyo JP |