发明名称 Recording method
摘要 A recording method includes a liquid substance discharge step of discharging a liquid substance from a discharge head toward a predetermined section of sections of the recording medium, and a radiation step of radiating light toward the liquid substance discharged on the recording medium. The liquid substance discharge step and the radiation step are performed n times, with n being an integer of 2 or greater, on the predetermined section to complete recording on the predetermined section while moving the discharge head and the recording medium relative to each other. In the n liquid substance discharge steps, with a recording rate of a first liquid substance discharge step being denoted by a % and a recording rate of a final liquid substance discharge step being denoted by b %, a>b.
申请公布号 US9044970(B2) 申请公布日期 2015.06.02
申请号 US201414176541 申请日期 2014.02.10
申请人 Seiko Epson Corporation 发明人 Tsunoya Akihiko
分类号 B41J2/01;B41J11/00;B41J2/14;B41M7/00 主分类号 B41J2/01
代理机构 Global IP Counselors, LLP 代理人 Global IP Counselors, LLP
主权项 1. A recording method for recording on a recording medium by discharging a liquid substance from a discharge head onto the recording medium while moving the discharge head and the recording medium relative to each other, the liquid substance having a photocuring property that is hardened by exposure to light radiation, the recording method comprising: a liquid substance discharge step of discharging the liquid substance from the discharge head toward a predetermined section of sections of the recording medium; and a radiation step of radiating the light toward the liquid substance discharged on the recording medium, the liquid substance discharge step and the radiation step being performed n times, with n being an integer of 2 or greater, on the predetermined section to complete recording on the predetermined section while moving the discharge head and the recording medium relative to each other, wherein in the n liquid substance discharge steps, with a recording rate of a first liquid substance discharge step being denoted by a % and a recording rate of a final liquid substance discharge step being denoted by b %, a>b.
地址 Tokyo JP