COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION METHOD EMPLOYING THE SAME

摘要

The present invention relates to a method for forming a pattern using extreme ultraviolet light, and provides a composition for forming a topcoat layer capable of generating an excellent pattern in an aspect of roughness and a pattern shape, and a method for forming a pattern employing the same. The present invention comprises a composition for forming a topcoat layer, which includes a graphene derivative and a solvent having a hydrophilic group, and provides a method for forming a pattern by exposing and developing a resist layer after applying the composition on the surface of a resist, wherein the composition may also include a polymer.