ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

An illumination system of microlithographic projection exposure apparatus (10) comprises each second light origin (106) and related multiple light introducing facet (75) having optic integrator (60). A space light modulator (52) contains a light exiting side (57) and penetrates or reflects the collide lights with space disassembling method. A pupil forming unit (36) is placed toward the space light modulator. An objective (58) images the light introducing facet (75) of the space light modulator (52) to the light introducing facet (75) of the optic integrator (60). The light exiting side (57) of the space light modulator (52) includes the groups (54-1 to 54-8) of the objective area (110) separated by the area (130) not imaged on the light introducing facet (75). The objective (58) combines the image (110′) of the objective area (110) adjacent to the optic integrator (60).