发明名称 |
MECHANISMS FOR WAFER CLEANING |
摘要 |
Embodiments that relate to mechanisms for cleaning wafers are provided. A method for wafer cleaning includes cleaning wafers by a wet-bench cleaning operation. The method also includes thereafter cleaning each of the wafers by a single-wafer cleaning operation. In addition, a cleaning apparatus for enhancing the performance of the above method is also provided. |
申请公布号 |
KR20150059609(A) |
申请公布日期 |
2015.06.01 |
申请号 |
KR20140161563 |
申请日期 |
2014.11.19 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
YU SHANG YUAN;KU SHAO YEN;HSIAO CHIEN WEN;HU HONG JIE;CHANG JUI CHUAN;TSAI WEN CHANG |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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