感光性树脂组成物、硬化膜的制造方法、硬化膜、液晶显示装置及有机ＥＬ显示装置;PHOTO-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE

摘要

本发明提供一种于显影步骤时感光性树脂组成物层与基底基板的密着性优异、且于烘烤步骤时感光性树脂组成物层不会热熔融而锥角高的感光性树脂组成物、硬化膜的制造方法、硬化膜、液晶显示装置及有机EL显示装置。本发明的感光性树脂组成物含有：(A-1)包含满足下述(1)及(2)的至少一个的聚合物的聚合物成分，(1)含有(a1)具有酸基经酸分解性基保护的基团的结构单元、及(a2)具有交联性基的结构单元的聚合物，(2)含有(a1)具有酸基经酸分解性基保护的基团的结构单元的聚合物、及含有(a2)具有交联性基的结构单元的聚合物；(S)通式(1)及/或通式(2)所表示的化合物；(B-1)光酸产生剂；以及(C-1)溶剂。;通式(1) 通式(2) A photo-sensitive resin composition, a method for manufacturing cured film, a cured film, a liquid crystal display device, and an organic El display device are provided, wherein the photo-sensitive resin composition has excellent adhesiveness between a photo-sensitive resin composition layer and a base substrate in a developing process, and the photo-sensitive resin composition layer is not thermally melted and has a high taper angle in a baking process. The photo-sensitive resin composition includes: (A-1) a polymer component including a polymer which satisfies at least one of the following (1) and (2), (1) a polymer which has (a1) a constituent unit having a group wherein an acid group is protected with a acid-decomposable group and (a2) a constituent unit having a crosslinkable group, (2) a polymer which has (a1) a constituent unit having a group wherein an acid group is protected with a acid-decomposable group and a polymer which has (a2) a constituent unit having a crosslinkable group; (S) a compound represented by the following general formula (1) and/or general formula (2); (B-1) a photoacid generator; and (C-1) a solvent.