发明名称 METHOD OF A FORMING STRUCTURE WITH FINE PATTERNS
摘要 <p>The present invention relates to a method for manufacturing structures with fine patterns and, more specifically, a manufacturing method of structures with fine patterns, which has increased productivity by using a polymer mold, comprising the steps of: (a) manufacturing a polymer mold whose surface has patterns; (b) coating the pattern on the polymer mold with fluid materials; (d) arranging a secondary structure supporting substrate on the polymer mold; (e) attaching a cured fluid material to the secondary structure supporting substrate; and (f) separating the polymer mold from the secondary structure supporting substrate and accordingly obtaining a second structure supporting substrate attached with the cured structure of the fluid materials formed by curing the fluid materials, thereby having a high yield, while having low possibility of pattern fault caused by air bubbles, and being good for making microstructure and high density.</p>
申请公布号 KR20150059190(A) 申请公布日期 2015.06.01
申请号 KR20130141902 申请日期 2013.11.21
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 PARK, JAE HONG;YANG, CHUNG MO;KIM, HEE YEOUN;KIM, BYEONG IL;KIM, WOO CHOONG;JANG, HYUN IK;KIM, HAN HEUNG;YOO, DONG EUN
分类号 B29C59/02 主分类号 B29C59/02
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